- Overview
- Quick Detail
- Description
- Key Features
- Specifications
- Applications
- Recommended Products
Overview
Place of Origin: |
USA |
Brand Name: |
AMAT |
Model Number: |
0100-11002 |
Packaging Details: |
Original new Factory Sealed |
Delivery Time: |
5-7 days |
Payment Terms: |
T/T |
Supply Ability: |
In stock |
Quick Detail
|
Bus Architecture: |
VME / VXI Standard |
|
Function: |
Transmit and process machine logic control signals |
|
Input Voltage: |
24 VDC |
|
Digital Inputs: |
16–32 channels (opto-isolated) |
|
Digital Outputs: |
16–32 channels (relay or transistor output) |
|
I/O Status Indicators: |
Onboard LEDs for each input/output channel |
|
Form Factor: |
8x8.6x26.1cm |
|
Weight: |
0.5 kg |
Description
The AMAT 0100-11002 is a Digital I/O VME Module manufactured by Applied Materials. This board is a key component in semiconductor manufacturing equipment and is commonly used in the classic Precision 5000 (P5000) series machines.
Key Features
Function: As a DI/DO (Digital Input/Digital Output) interface board, it is responsible for the transmission and processing of machine logic control signals.
Bus Architecture: Adopts VME/VXI module standards and is integrated into the machine's mainframe.
Electrical Specifications: Typically operates at 24 VDC; onboard LED indicators monitor input/output status.
Specifications
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Operating Temperature: |
0°C to 70°C |
|
Storage Temperature: |
-20°C to 85°C |
|
Isolation: |
Optical or electrical isolation for inputs and outputs |
|
Mounting: |
VME 6U or compatible chassis slot |
|
Compliance: |
VME64 / VXI Standards |
Applications
Widely used in Applied Materials' 200mm wafer processing equipment, including etching, chemical vapor deposition (CVD), and physical vapor deposition (PVD) tools:
Etching Equipment Control
The 0100-11002 is used to interface with sensors, RF generators, and mass flow controllers in 200 mm wafer etching systems. It monitors process conditions such as pressure, gas flow, and plasma parameters, while controlling actuators, valves, and interlocks in real time to ensure precise etch profiles.
Chemical Vapor Deposition (CVD) Tools
In CVD systems, the module manages digital signals for gas delivery, temperature control, and substrate handling. Its opto-isolated inputs protect the main controller from electrical noise while providing reliable monitoring of critical process parameters. Digital outputs trigger heaters, gas valves, and pump systems to maintain uniform thin film deposition across wafers.
Physical Vapor Deposition (PVD) Systems
For PVD tools, the 0100-11002 coordinates deposition sources, vacuum pumps, and substrate rotation mechanisms. High-speed digital I/O allows synchronization of multiple chambers, ensuring consistent film thickness and uniformity across 200 mm wafers.
Multi-Chamber Semiconductor Equipment Integration
The module’s VME/VXI bus architecture enables integration of multiple 0100-11002 modules in a single chassis. This scalability allows control of multi-chamber systems, providing sufficient I/O channels for sensors and actuators in large-scale semiconductor processing tools.